SZFI Seminar
Speaker: Ranna Masheyeva (Wigner RCP)
Title: Quantifying Plasma–Surface Interactions
Date: Tuesday, 27. October 10:00
Place: Building 1, 1st floor, Large lecture hall
Abstract:
Low-temperature plasmas are widely used in many technological applications, including plasma processing, surface modification, thin-film deposition, and microelectronics. In these systems, plasma–surface interactions play a fundamental role in determining the discharge characteristics. While energetic plasma particles continuously modify the electrode surfaces, the surfaces simultaneously affect the plasma through processes such as secondary electron emission and electron reflection. Therefore, an accurate understanding and quantification of plasma–surface interaction processes are essential for both plasma diagnostics and predictive plasma modeling.
Among the various plasma–surface interaction processes, secondary electron emission has a particularly strong influence on electron heating, ionization, and discharge sustainment. However, the effective secondary electron emission coefficient, γ, is not solely determined by the electrode material but also depends on the gas, discharge conditions, and the actual state of the surface. As a result, values measured in beam experiments often differ from those under realistic plasma operating conditions, making the in-situ determination of γ an important and challenging task.
We have developed an in-situ diagnostic method [1] to determine the effective secondary electron emission coefficient by combining measurements with simulations. The method was first investigated computationally and subsequently validated experimentally for argon plasmas [2]. More recently, it has been extended to helium and neon discharges, demonstrating its applicability over a wider range of operating conditions [3].
Hivatkozások:
[1] Masheyeva R U, Dzhumagulova K N, Myrzaly M, Schulze J and Donkó Z 2021 AIP Adv. 11 075024
[2] Masheyeva R U, Hartmann P, Luo L-Y, Dzhumagulova K, Liu Y-X, Schulze J and Donkó Z 2025 J. Phys. D: Appl. Phys. 58 045208
[3] Masheyeva R U, Derzsi A, Dzhumagulova K, Myrzaly M, Donkó Z and Hartmann P 2026 J. Phys. D: Appl. Phys. 59 105201
