Előadó: Horváth Benedek (SZFI)
Előadás címe: Control of particle properties in low-pressure radio frequency gas discharges
Dátum: 2023. július 11. kedd, 10.00
Helyszín: KFKI Telephely, I. épület 1. emeleti Tanácsterem
Összefoglaló:
Capacitively coupled plasmas (CCPs) are widely applied in modern plasma processing technologies like etching, deposition and cleaning. The substrate located on one of the electrodes undergoes bombardment by plasma particles, so the control of the energy and the flux of these particles at the electrodes, which determine the various surface processes, is crucial. A detailed understanding of the complex physics of CCPs facilitates the knowledge-based optimization of plasma processing applications.
The current thesis aims the fundamental understanding of low-pressure CCPs operated under various conditions. The electron power absorption and ionization dynamics and the role of surface processes in CCPs are addressed, combining particle-based computational studies with experiments. The accurate modelling of various surface processes in particle-in-cell/Monte Carlo collisions simulations of CCPs is in focus of this work. New details of the electron power absorption and the ionization dynamics in CCPs are discovered, and the effects of various surface processes on the plasma parameters are revealed. Unkown surface coefficients are determined and the applicability of spectroscopic methods to probe the discharge operation mode is also investigated. Moreover, efficient control of the sputtering yield is achieved in low-pressure CCPs, which can facilitate the optimization of plasma processing applications based on fundamental understanding of the dynamics of CCPs.
[1] B Horváth, A Derzsi, J Schulze, I Korolov, P Hartmann, Z Donkó 2020 Plasma Sources Science and Technology 29 055002
[2] B Horváth, Z Donkó, J Schulze, A Derzsi 2022 Plasma Sources Science and Technology 31 045025
[3] A Derzsi, B Horváth, Z Donkó, J Schulze 2020 Plasma Sources Science and Technology 29 074001
